Mask process correction validation for multi-beam mask lithography

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Mask process correction validation for multi-beam mask lithography

In this paper, we present a full cycle of MPC calibration and verification, using existing, proven mask processes in combination with a novel MBMW system.

Mask Process Correction (MPC) is well established as a necessary step in mask data preparation, but was developed for vector-shaped beam (VSB) mask writers. We demonstrate that Calibre MPC is fully applicable to multi-beam mask writers.

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